Photomask used in fabrication of mask read only memory
US6139992A · kind A · utility
1Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 1999 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | Jan 11, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B20/65
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask used in a formation of a mask read only memory (mask ROM) device is provided. The photomask contains a bonding pad opening pattern and a code area opening pattern so that bonding pads and code areas are simultaneously formed in a more economical operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.