Use of intersecting subresolution features for microlithography
US6139994A · kind A · utility
61Cited by
10References
33Claims
0Family size
Inventors
Key dates
| Filing date | Jun 25, 1999 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | Jun 25, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for creating an image on an image plane utilizing a photomask comprised of a plurality of intersecting subresolution features. Energy created by an energy source is projected through the subresolution features which diffract the light to produce constructive or positive interference thereby resulting in an image being formed on the image plane that is different than the image or pattern of subresolution features on the photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.