Charged particle beam transfer method
US6140021A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 1999 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | May 7, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
This invention provides the charged particle beam transfer method, which can control adverse effect of distortion or blur that arises from the space charge effect due to the non-uniform pattern density to a minimum. A pattern formed on reticle is raster or step-and-repeat scanned with a charged particle beam and is illuminated in consecutive order, and a pattern image of a sub-field, which is illuminated, is to be formed on a certain position of a radiation sensitive substrate. On the radiation sensitive substrate whole pattern is projected through stitching the said pattern image. The pattern is to be divided into plural areas A and B which differ in pattern density one another, and the above-described scan boundary is made to coincide with the boundary of these plural areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.