Chemicals and processes for making fluorinated poly(para-xylylenes)
US6140456A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 24, 1997 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | Oct 24, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/3424
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
New starting materials and chemical processes will be used to make fluorinated poly(para-xylylenes) (F-PPX) and fluorinated poly(para-fluoroxylylenes) (F-PPFX). The processes will use some very low cost and readily available starting materials, catalysts, chemical reactors, transport polymerization (TP) systems, and chemical vapor deposition (CVD) systems commonly used for making F-PPX. New TP and CVD deposition systems will also be used to make F-PPX and F-PPFX. These polymers are used for the manufacture of low dielectric films with high thermal stability and are sufficiently strong to withstand planarization and polishing for the manufacture of integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.