Patent · US Expired

Protective liner for isolation trench side walls and method

US6143625A · kind A · utility

7Cited by
6References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 10, 1998
Grant dateNov 7, 2000
Priority date
Expiry dateSep 10, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S148/05
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An isolation trench (60) may comprise a trench (20) formed in a semiconductor layer (12). A barrier layer (22) may be formed along the trench (20). A protective liner (50) may be formed over the barrier layer (22). The protective liner (50) may comprise a chemically deposited oxide. A high density layer of insulation material (55) may be formed in the trench (20) over the protective liner (50).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.