Apparatus for processing substrates in a fluid tank
US6145520A · kind A · utility
2Cited by
2References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 23, 1998 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Oct 23, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for the processing of substrates in a fluid tank is provided. The fluid tank has at least one fluid inlet opening and at least one overflow opening in the upper region of at least one side wall of the fluid tank. Optimum adaptation to fluid circulation rates is provided by at least one slide having a variable position relative to the overflow opening for varying the opening area thereof. This opening area is smaller during introduction of gas than during a preceding rinsing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.