Polycyclic resist compositions with increased etch resistance
US6147177A · kind A · utility
11Cited by
2References
13Claims
0Family size
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Key dates
| Filing date | Feb 19, 1999 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Feb 19, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.