Wafer test fixture using a biasing bladder and methodology
US6147506A · kind A · utility
31Cited by
20References
37Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1997 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Apr 29, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2831
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A wafer test and burn-in fixture and methodology including a wafer probe having flexible tabs and a load board coupled to the wafer probe using the flexible tabs. The fixture also includes a bladder which biases the wafer probe to contact a wafer. A temperature control apparatus is provided to control the temperature of the wafer probe and the wafer. Tests are performed on the wafer using built-in self tests or wrap wiring tests.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.