Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
US6150069A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 13, 1999 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | May 13, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to oxabicyclo compounds and a method of preparing the same. The compounds of the present invention can be used as monomers for preparing a photoresist resin which is useful in photolithography processes using ultra-violet light sources, and are represented by the following Formula 1: ##STR1## wherein, R.sub.1 and R.sub.2 are the same or different, and represent a hydrogen or a C.sub.1 -C.sub.4 straight or branched chain substituted alkyl group; and m is a number from 1 to 4. In other embodiments, the present invention relates to an ArF or a KrF photoresist resin containing an oxabicyclo monomer, and compositions and photoresist micro pattern forming methods using the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.