Tandem process chamber
US6152070A · kind A · utility
399Cited by
16References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1996 |
| Grant date | Nov 28, 2000 |
| Priority date | — |
| Expiry date | Nov 18, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67201
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.