Apparatus for etching discs and pallets prior to sputter deposition
US6156154A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1999 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Jun 23, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention are directed to an etching apparatus for removing impurities from the surface of a substrate, such as a pallet and disc. Embodiments of the etching apparatus comprise a magnetic source, a cleaning chamber, a substrate transportation mechanism and a power source. The magnetic source is placed within the cleaning chamber, or vacuum chamber, which is configured to bombard the magnetic source with plasma. The substrate transportation mechanism resides within the cleaning chamber and is used to pull the pallet through the chamber between the spacing between the magnet towers. The power source, which is a DC source, is coupled to the pallet and produces an electric field which ionizes the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.