Top surface imaging technique for top pole tip width control in magnetoresistive read/write head processing
US6156487A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 1998 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Oct 23, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/3996
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A top surface imaging technique for top pole tip width control in a magnetoresistive ("MR") or giant magnetoresistive ("GMR") read/write head is disclosed in which a multi-layer structure is employed to define the thick photoresist during processing resulting in much improved dimensional control. To this end, a relatively thin upper photoresist layer is patterned with much improved resolution, an intermediate metal or ceramic layer is then defined utilizing the upper photoresist layer as a reactive ion etching ("RIE") mask, with the intermediate layer then being used as an etching mask to define the bottom-most thick photoresist layer in a second RIE process. As a consequence, a much improved sub-micron pole tip width along with a high aspect ratio and vertical profile is provided together with much improved critical dimension control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.