Defect inspection apparatus for silicon wafer
US6157444A · kind A · utility
48Cited by
1References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1998 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | Nov 24, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In order to easily evaluate defects of the silicon wafer affecting the characteristic of a device, the present invention provides a defect inspection apparatus for detecting defects existing on a surface of a sample and/or inside the sample, which comprises a display apparatus for displaying a distribution of the defects on a graph having coordinate axes of distance from a central position of the sample and the depth where the defect exists based on the depth information and the positional information obtained by a detecting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.