F.sub.2 (157nm) laser employing neon as the buffer gas
US6157662A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 24, 1999 |
| Grant date | Dec 5, 2000 |
| Priority date | — |
| Expiry date | May 24, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2302/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An F.sub.2 -laser has a discharge chamber containing a laser gas mixture including fluorine as a laser active component and neon as a buffer gas. The gas mixture is surrounded by a resonator and supplied with a pulsed discharge by a pair of electrodes connected to a power supply circuit. The concentration of neon within the gas mixture is preferably higher than any other constituent gas, and is more preferably the only gas accompanying the laser active molecular fluorine. In addition, the gas mixture is preferably maintained at an elevated temperature such as near, yet below, a temperature at which outgassing occurs within the discharge chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.