Patent · US Expired

F.sub.2 (157nm) laser employing neon as the buffer gas

US6157662A · kind A · utility

39Cited by
3References
32Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 24, 1999
Grant dateDec 5, 2000
Priority date
Expiry dateMay 24, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S2302/00
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An F.sub.2 -laser has a discharge chamber containing a laser gas mixture including fluorine as a laser active component and neon as a buffer gas. The gas mixture is surrounded by a resonator and supplied with a pulsed discharge by a pair of electrodes connected to a power supply circuit. The concentration of neon within the gas mixture is preferably higher than any other constituent gas, and is more preferably the only gas accompanying the laser active molecular fluorine. In addition, the gas mixture is preferably maintained at an elevated temperature such as near, yet below, a temperature at which outgassing occurs within the discharge chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.