Patent assignee · DE · COMPANY

Lambda Physik AG

152Patents
1Active
152Granted
41Portfolio score

Filing activity: Mar 17, 1983 → Jan 18, 2007 · 1 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US6219368A Beam delivery system for molecular fluorine (F2) laser Electricity 130 Expired
US5676866A Apparatus for laser machining with a plurality of beams Electricity 78 Expired
US6005880A Precision variable delay using saturable inductors Electricity 58 Expired
US6172329A Ablated laser feature shape reproduction control Performing Operations; Transporting 57 Expired
US5946337A Hybrid laser resonator with special line narrowing Electricity 54 Expired
US6002697A Diode pumped laser with frequency conversion into UV and DUV range Electricity 54 Expired
US6014206A Stabilization of angular and lateral laser beam position Electricity 52 Expired
US6061382A Laser system and method for narrow spectral linewidth through wavefront curvature compensation Electricity 51 Expired
US6804327B2 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays Electricity 51 Expired
US6160831A Wavelength calibration tool for narrow band excimer lasers Physics 48 Expired
US4916707A Control circuit for a pulsed gas laser Electricity 41 Expired
US6157662A F.sub.2 (157nm) laser employing neon as the buffer gas Electricity 39 Expired
US4534034A Discharge-pumped laser Electricity 38 Expired
US6160832A Method and apparatus for wavelength calibration Electricity 37 Expired
US6389045B1 Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers Emerging Cross-Sectional Technologies 36 Expired
US6243405A Very stable excimer or molecular fluorine laser Electricity 35 Expired
US6393037B1 Wavelength selector for laser with adjustable angular dispersion Electricity 32 Expired
US6580517B2 Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp Electricity 31 Expired
US6898216B1 Reduction of laser speckle in photolithography by controlled disruption of spatial coherence of laser beam Electricity 30 Expired
US6414438B1 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it Electricity 30 Expired
US6081542A Optically pumped laser with multi-facet gain medium Electricity 29 Expired
US6212214A Performance control system and method for gas discharge lasers Electricity 28 Expired
US6563853B2 Gas performance control system for gas discharge lasers Electricity 24 Expired
US6493364B1 Beam shutter for excimer laser Electricity 23 Expired
US6490307B1 Method and procedure to automatically stabilize excimer laser output parameters Electricity 22 Expired

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.