Substrate holding apparatus for processing semiconductor
US6159301A · kind A · utility
272Cited by
3References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 17, 1998 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Dec 17, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68785
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate-holding apparatus for holding a semiconductor substrate in a semiconductor processor is characterized in that the apparatus includes a mount block made of, e.g., aluminum nitrate with a high-frequency electrode embedded therein and a heating block made of, e.g., an aluminum alloy with a heating body embedded therein. The mount block is tightly attached to the heating block by engaging the bottom surface of the mount block with the top surface of the heating block, for example, by using a latching mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.