Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin
US6165672A · kind A · utility
14Cited by
9References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 1998 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Sep 14, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a novel maleimide- or alicyclic olefin-based monomer, a copolymer resin of these monomers and a photoresist using the copolymer resin. The maleimide-introduced copolymer resin according to the present invention can easily be copolymerized with alicyclic olefin unit, has a physical property capable of enduring in 2.38% TMAH developer and increases adhesion of ArF or KrF photoresist. The photoresist film using a copolymer resin according to the present invention can be applied to highly integrate semiconductor devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.