Cheol Kyu Bok
76Patents
14h-index
46Co-inventors
84Inventor score
Filing activity: Jul 18, 1989 → Jun 16, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6225020A | Polymer and a forming method of a micro pattern using the same | Physics | 471 | Expired |
| US7467632B2 | Method for forming a photoresist pattern | Chemistry; Metallurgy | 462 | Active |
| US6316162A | Polymer and a forming method of a micro pattern using the same | Emerging Cross-Sectional Technologies | 460 | Expired |
| US7238653B2 | Cleaning solution for photoresist and method for forming pattern using the same | Chemistry; Metallurgy | 448 | Expired |
| US6916594B2 | Overcoating composition for photoresist and method for forming photoresist pattern using the same | Physics | 102 | Expired |
| US6132926A | ArF photoresist copolymers | Physics | 46 | Expired |
| US6866984B2 | ArF photoresist copolymers | Chemistry; Metallurgy | 43 | Expired |
| US6599844B2 | Method and forming fine patterns of semiconductor devices using passivation layers | Physics | 33 | Expired |
| US8999848B2 | Method for forming fine pattern of semiconductor device using double spacer patterning technology | Electricity | 21 | Active |
| US4994409A | Method for manufacturing a trench capacitor using a photoresist etch back process | Electricity | 19 | Expired |
| US7576009B2 | Method for forming fine pattern of semiconductor device | Electricity | 18 | Active |
| US6235448A | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Physics | 15 | Expired |
| US6143463A | Method and photoresist using a photoresist copolymer | Emerging Cross-Sectional Technologies | 15 | Expired |
| US6165672A | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6632903B2 | Polymer-containing photoresist, and process for manufacturing the same | Chemistry; Metallurgy | 14 | Expired |
| US6312865A | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | Chemistry; Metallurgy | 13 | Expired |
| US6265130A | Photoresist polymers of carboxyl-containing alicyclic compounds | Emerging Cross-Sectional Technologies | 12 | Expired |
| US9202744B1 | Methods of fabricating interconnection structures | Electricity | 10 | Active |
| US6369181B1 | Copolymer resin, preparation thereof, and photoresist using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7615497B2 | Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer | Emerging Cross-Sectional Technologies | 8 | Active |
| US6248847A | Copolymer resin, preparation thereof, and photoresist using the same | Physics | 5 | Expired |
| US5888698A | Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same | Emerging Cross-Sectional Technologies | 5 | Expired |
| US9523917B2 | Methods of forming patterns | Chemistry; Metallurgy | 5 | Active |
| US8202683B2 | Method for forming pattern of semiconductor device | Electricity | 4 | Active |
| US7776747B2 | Semiconductor device and method for forming pattern in the same | Electricity | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.