Resist composition with radiation sensitive acid generator
US6165673A · kind A · utility
0Cited by
14References
48Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1997 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Mar 7, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.