Polymers and photoresist compositions for short wavelength imaging
US6165674A · kind A · utility
9Cited by
17References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1998 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Jan 15, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron features imaged at 193 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that includes a cyano moiety, as well as polymers that contain cyano and itaconic anhydride moieties in combination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.