Isolation of novolak resin by low temperature sub surface forced steam distillation
US6165675A · kind A · utility
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3References
5Claims
0Family size
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Key dates
| Filing date | Apr 2, 1998 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Apr 2, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.