Chemically amplified resist
US6168900A · kind A · utility
1Cited by
9References
2Claims
0Family size
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Inventor
Key dates
| Filing date | Mar 9, 1998 |
| Grant date | Jan 2, 2001 |
| Priority date | — |
| Expiry date | Mar 9, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by preventing problem of T-shaped resist pattern and reinforcing exposure dependence of solution speed, a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weight are used as a basic polymer of chemically amplified resist together with PAG. Preferable molecular-weight ratio and mixing ratio of the mixture are 1:5 to 1:20, and 10 to 30 parts by weight of low molecular-weight polymer to 100 parts of high molecular-weight polymer, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.