Method of removing surface oxides found on a titanium oxynitride layer using a nitrogen containing plasma
US6169027A · kind A · utility
5Cited by
21References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 21, 1997 |
| Grant date | Jan 2, 2001 |
| Priority date | — |
| Expiry date | Nov 21, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76882
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention consists in a method of filling recesses in a surface layer of a workpiece with conductive material including the steps of: PA1 forming a barrier layer on the surface; PA1 depositing a layer of conductive material on to the barrier layer; PA1 and forcing, flowing or drifting the conductive material into the recesses characterized in that the barrier layer includes Oxygen or is oxidized and oxidized material in the surface of the layer is nitrided prior to the deposition of the conductive material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.