Gas feedthrough with electrostatic discharge characteristic
US6170430A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 1999 |
| Grant date | Jan 9, 2001 |
| Priority date | — |
| Expiry date | Apr 13, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A gas feedthrough in a semiconductor processing apparatus comprises a static-dissipative composite material. This material is characterized by good resistance to electromigration and is preferably made of a homogeneous material. This apparatus for preventing the transfer of energy to a gas flown through a gas line and comprises a gas feedthrough comprising a static-dissipative material, the feedthrough having a first end for abuttingly contacting an electrically energized member and a second end for contacting a grounded member, the feedthrough defining a void therein along its length to house a gas line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.