Diamond film deposition on substrate arrays
US6173672A · kind A · utility
8Cited by
36References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 6, 1997 |
| Grant date | Jan 16, 2001 |
| Priority date | — |
| Expiry date | Jun 6, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4582
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus is disclosed for depositing diamond film on a plurality of substrates, and includes: a plasma beam containing atomic hydrogen and a carbonaceous component, and a plurality of substrates, each of the substrates having a deposition surface, the substrates being arranged such that the beam impinges successively on a deposition surface of a first of the substrates and then on a deposition surface of a second of the substrates, the deposition surfaces of the first and second substrates being oriented with respect to each other at a non-zero angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.