Process for treating a semiconductor substrate
US6173720A · kind A · utility
4Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 1998 |
| Grant date | Jan 16, 2001 |
| Priority date | — |
| Expiry date | Dec 2, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/30604
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Semiconductor substrates are contacted with a deionized water solution containing an acidic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.