Patent · US Expired

Electron beam treatment of siloxane resins

US6177143A · kind A · utility

26Cited by

14References

24Claims

0Family size

Inventors

Carl Treadwell · Menlo Park, US
Jingjun Yang · Nanhu, CN
Matthew Ross · San Diego, US

Key dates

Filing date	Jan 6, 1999
Grant date	Jan 23, 2001
Priority date	—
Expiry date	Jan 6, 2019

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/02282
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Electron beam cured siloxane dielectric films and to a process for their manufacture which are useful in the production of integrated circuits. A siloxane polymer having in one aspect less than 40 Mole percent carbon containing substituents, and in another aspect at least approximately 40 Mole percent carbon containing substituents is cured by a wide beam electron beam exposure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.