Fused hybrid resist shapes as a means of modulating hybrid resist space width

US6184041A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Toshiharu Furukawa · South Burlington, US
• Mark C. Hakey · Saint Albans, US
• Steven J. Holmes · Colchester, US
• David V. Horak · South Burlington, US
• Paul A. Rabidoux · Winooski, US

Key dates

• Filing date: May 13, 1998
• Grant date: Feb 6, 2001
• Expiry date: May 13, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The preferred embodiment of the present invention overcomes the limitations of the prior art and provides a method to form spaces in hybrid resist with varying widths. In particular, the preferred method facilitates the formation of spaces with different widths by using mask shapes (either openings or lines) that are smaller than the diffraction limit of the photolithography tool. Diffraction effects at these dimensions reduce the light intensity reaching the resist surface such that the hybrid resist receives an intermediate exposure. These portions of hybrid resist that receive an intermediate exposure are soluble in developer and thus develop away to form spaces in the hybrid resist. Thus, spaces in the hybrid resist of varying widths can be formed.