Apparatus and method for evaluating a target larger than a measuring aperture of a sensor
US6184974A · kind A · utility
60Cited by
10References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 1999 |
| Grant date | Feb 6, 2001 |
| Priority date | — |
| Expiry date | Jul 1, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A Shack-Hartmann wavefront sensor having an aperture which is smaller than the size of an object being measured is used to measure the wavefront for the entire object. The wavefront sensor and the object are translated relative to one another to measure the wavefronts at a plurality of subregions of the object. The measured wavefronts are then stitched together to form a wavefront of the object. The subregions may overlap in at least one dimensions. A reference surface may be provided to calibrate the wavefront sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.