Patent assignee · US · COMPANY

Wavefront Sciences, Inc.

17Patents
0Active
17Granted
34Portfolio score

Filing activity: Feb 5, 1999 → Apr 21, 2006

Most-cited patents

PatentTitleAreaCited byStatus
US6550917B1 Dynamic range extension techniques for a wavefront sensor including use in ophthalmic measurement Physics 147 Expired
US6130419A Fixed mount wavefront sensor Physics 67 Expired
US6607274B2 Method for computing visual performance from objective ocular aberration measurements Human Necessities 63 Expired
US6184974A Apparatus and method for evaluating a target larger than a measuring aperture of a sensor Physics 60 Expired
US6908196B2 System and method for performing optical corrective procedures with real-time feedback Human Necessities 59 Expired
US6634750B2 Tomographic wavefont analysis system and method of mapping an optical system Human Necessities 57 Expired
US6052180A Apparatus and method for characterizing pulsed light beams Physics 48 Expired
US6819413B2 Method and system for sensing and analyzing a wavefront of an optically transmissive system Physics 46 Expired
US6376819B1 Sub-lens spatial resolution Shack-Hartmann wavefront sensing Physics 37 Expired
US6547395B1 Methods of measuring moving objects and reducing exposure during wavefront measurements Physics 20 Expired
US6624896B1 System and method for metrology of surface flatness and surface nanotopology of materials Physics 11 Expired
US7078665B2 System and method of wavefront sensing for determining a location of focal spot Physics 8 Expired
US6656373B1 Apodized micro-lenses for Hartmann wavefront sensing and method for fabricating desired profiles Physics 7 Expired
US7335867B2 Method of wavefront sensing by mapping boundaries of a lenslet array onto a grid of pixels Physics 4 Expired
US7122774B2 System and method of wavefront sensing Physics 3 Expired
US6790688B2 Method of high pass filtering a data set Physics 2 Expired
US6864043B2 Apodized micro-lenses for Hartmann wavefront sensing and method for fabricating desired profiles Physics 2 Expired

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.