Antireflective coating for photoresist compositions
US6187506A · kind A · utility
20Cited by
8References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 5, 1999 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Aug 5, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or mixture of solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and does not contain a crosslinking group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.