Discharge lamp sources apparatus and methods
US6188076A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 1999 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Dec 17, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.