Light weight high-stiffness stage platen
US6188150A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 16, 1999 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Jun 16, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An improved light weight, stiff stage platen for photolithography is provided. The high stiffness of the stage platen is exemplified by a relatively high first resonant vibrational mode as determined, for instance, by finite element modal analysis. The stage platen can be employed to support a chuck that is designed to secure a mask or wafer. The stage platen includes a frame that has interior walls that define an interior region and that has exterior walls wherein the outer surfaces of at least two adjacent walls are reflective mirror surfaces; and a matrix of ribs within the interior region that is connected to the interior walls wherein the stage platen exhibits a first vibrational mode at a frequency of greater than about 1000 Hz.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.