Micro electron beam source and a fabrication process thereof
US6188167A · kind A · utility
7Cited by
22References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 1997 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Nov 28, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/025
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for fabricating a micro-field emission gun including the steps of providing an insulator slab, formed with a penetrating hole acting as a passage of an electron beam, upon a gate electrode of the micro-field emission gun, such that the penetrating hole is aligned with an emitter of the micro-field emission gun, bonding an insulator slab upon the gate electrode by means of an anodic bonding process, and providing an acceleration electrode on the insulator slab such that the acceleration electrode covers a surface of said insulator slab facing away from said gate electrode, except for a passage of the electron beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.