Substrate processing device
US6189552A · kind A · utility
7Cited by
4References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 24, 1999 |
| Grant date | Feb 20, 2001 |
| Priority date | — |
| Expiry date | May 24, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for processing substrates is provided. The apparatus includes a receptacle for containing processing fluid, and at least one substrate support. Components of the receptacle and/or substrate support that come into contact with processing fluid have a protective layer. Guide or support members for the substrates are fused to the protective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.