Mask compatible with different steppers
US6190807A · kind A · utility
9Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 8, 1999 |
| Grant date | Feb 20, 2001 |
| Priority date | — |
| Expiry date | Feb 8, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7084
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask includes a piece of reticle glass, a chromium thin film, a pre-alignment mark, a first alignment mark, a second alignment mark, a first identification barcode, and a second identification barcode. There is also a pellicle flame formed on the chromium thin film to prevent the patterning defects caused by particles. The mask of the invention is compatible with an ASML stepper and a Nikon stepper
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.