Chemical mechanical polisher
US6196896A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 1997 |
| Grant date | Mar 6, 2001 |
| Priority date | — |
| Expiry date | Oct 31, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B41/06
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A chemical mechanical polisher includes a substrate carrier and support system which employs at least one motor to drive the substrate carrier through polishing motions. An additional driver for driving at least a portion of the carrier in directions perpendicular to the motions supplied by the motor(s) is also included. A clamping flexure is provided to selectively lock the substrate carrier in a vertical position. The substrate carrier, in one embodiment is mounted to a vertical driver via a column. The column is guided by spiral flexures to prevent motion in directions normal to vertical. An air mount is provided to support the majority of the mass of the substrate carrier, so that only a small force need be applied by the additional driver for movements in the vertical direction. Another drive mechanism is also described which provides both polishing motions as well as vertical force application.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.