Photosensitive composition and a pattern forming process using the same
US6197473A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 1998 |
| Grant date | Mar 6, 2001 |
| Priority date | — |
| Expiry date | Sep 17, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The objectives of the present invention are to provide a photosensitive composition having high solubility to organic solvents as well as to alkaline developers or water-base developers of pH 11 or less, and to provide a pattern forming process for obtaining a high-resolution resist pattern. These objectives are achieved by means of a photosensitive composition comprising a compound which is glassy at room temperature and has a cyclic structure with three or more aromatic rings containing an acid-decomposable substituent, and a pattern forming process wherein a photosensitive material using said photosensitive composition is exposed to a light pattern and developed with an aqueous solution of an alkali or with a water-base developer of pH 11 or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.