Patent · US Expired

Ferroelectric element and method of producing the same

US6198119A · kind A · utility

56Cited by
5References
49Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 11, 1997
Grant dateMar 6, 2001
Priority date
Expiry dateMar 11, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02266
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A ferroelectric element is provided that can be highly densely integrated having a high Pr and a small Ec by using a ferroelectric thin film of the perovskite structure. A large distortion is imparted to the crystalline lattices of a ferroelectric thin film of the perovskite structure by using in combination elements having dissimilar ionic radii for the A-site that constitutes crystalline lattices, for the B-site and for the C-site that produces polarization, in order to obtain a ferroelectric element of a structure in which the ferroelectric thin film exhibiting a high spontaneous polarization and a small coersive electric field is sandwiched by the electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.