Photoresist compositions comprising blends of photoacid generators
US6200728A · kind A · utility
27Cited by
10References
109Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1999 |
| Grant date | Mar 13, 2001 |
| Priority date | — |
| Expiry date | Feb 20, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.