Chemically amplified resist material and process for the formation of resist patterns
US6207342A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1998 |
| Grant date | Mar 27, 2001 |
| Priority date | — |
| Expiry date | Apr 24, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Chemically amplified resist material which comprises: I. an acid-sensitive terpolymer produced upon copolymerization of (i) a first monomer unit having a structure which contains an alkali-soluble group protected with an alicyclic hydrocarbon-containing protective group, (ii) a second monomer unit having a lactone structure, and (iii) a third monomer unit having a structure which contains an alkali-soluble group protected with a protective group different from that of said first monomer unit; and II. a photoacid generator capable of producing an acid upon exposure to a patterning radiation, and the process for forming resist patterns using this resist material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.