Optical stress generator and detector
US6208421A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2000 |
| Grant date | Mar 27, 2001 |
| Priority date | — |
| Expiry date | Feb 23, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a system for the characterization of thin films and interfaces between thin films through measurements of their mechanical and thermal properties. In the system light is absorbed in a thin film or in a structure made up of several thin films, and the change in optical transmission or reflection is measured and analyzed. The change in reflection or transmission is used to give information about the ultrasonic waves that are produced in the structure. The information that is obtained from the use of the measurement methods and apparatus of this invention can include: (a) a determination of the thickness of thin films with a speed and accuracy that is improved compared to earlier methods; (b) a determination of the thermal, elastic, and optical properties of thin films; (c) a determination of the stress in thin films; and (d) a characterization of the properties of interfaces, including the presence of roughness and defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.