X-ray mask provided with an alignment mark and method of manufacturing the same
US6212252A · kind A · utility
8Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 1998 |
| Grant date | Apr 3, 2001 |
| Priority date | — |
| Expiry date | Oct 23, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray mask which is provided with an alignment mark and a transfer circuit pattern having a high position accuracy can be manufactured through a simplified manufacturing process. A membrane allowing passage of X-rays is formed on a substrate. A X-ray absorber intercepting transmission of X-rays is formed on the membrane. The substrate includes a window exposing the membrane. The X-ray absorber includes a transfer circuit pattern and an alignment mark formed in a region not overlapping with the window in a plan view.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.