Method to operate GEF4 gas in hot cathode discharge ion sources
US6215125A · kind A · utility
15Cited by
5References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1998 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Sep 16, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides a method of extending, i.e. prolonging, the operating lifetime of hot cathode discharge ion source by utilizing and introducing a nitrogen-containing co-bleed gas into an ion implantation apparatus which contains at least a hot cathode discharge ion source and an ion implantation gas such as GeF.sub.4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.