Compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography
US6215128A · kind A · utility
19Cited by
5References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1999 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Mar 18, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An improved compact tandem photon and electron beam lithography system includes a field lens adjacent the photoemission source which is utilized in combination with an objective lens to minimize field aberrations in the usable emission pattern and minimize the interaction between electrons to improve the throughput of the system. If desired, a demagnifying lens can be utilized between the field lens and the objective lens to increase the demagnification ratio of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.