Plasma processing system
US6216632A · kind A · utility
23Cited by
3References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 8, 1999 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Jan 8, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32688
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system includes a reactor having a plasma source and a substrate holder. The reactor is configured by a top plate made of a nonmagnetic metal, a bottom plate made of a metal, and a cylindrical side wall having at least in part a section made of ceramic. The substrate holder is placed in the bottom plate. A plurality of magnets is separately arranged on the top plate. The polarity of the magnets facing the inside of the reactor is alternately changed, and the magnets generate a magnetic field with closed magnetic fluxes near to the inner surface of the top plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.