Pattern matching system and method which performs local stability analysis for improved efficiency
US6219452A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 1999 |
| Grant date | Apr 17, 2001 |
| Priority date | — |
| Expiry date | Jan 6, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30108
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method for performing pattern matching to locate zero or more instances of a template image in a target image. The method first comprises sampling the template image using a Low Discrepancy sequence, also referred to as a quasi-random sequence, to determine a plurality of sample pixels in the template image which accurately characterize the template image. The Low Discrepancy sequence is designed to produce sample points which maximally avoid each other. After the template image is sampled or characterized, the method then performs pattern matching using the sample pixels and the target image to determine zero or more locations of the template image in the target image. The method may also perform a local stability analysis around at least a subset of the sample pixels to determine a lesser third number of sample pixels which have a desired degree of stability, and then perform pattern matching using the third plurality of sample pixels. In one embodiment, the local stability analysis determines a plurality of sets of sample pixels with differing stability neighborhood sizes, and the pattern matching performs a plurality of iterations of pattern matching using differen…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.