Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask
US6221541A · kind A · utility
3Cited by
6References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 15, 2000 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | May 15, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.