Developers for polychloroacrylate and polychloromethacrylate based resists
US6221568A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 1999 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | Oct 20, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.