Wayne M. Moreau
102Patents
25h-index
130Co-inventors
93Inventor score
Filing activity: Dec 19, 1973 → Oct 2, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6420088B1 | Antireflective silicon-containing compositions as hardmask layer | Emerging Cross-Sectional Technologies | 125 | Expired |
| US6558475B1 | Process for cleaning a workpiece using supercritical carbon dioxide | Emerging Cross-Sectional Technologies | 63 | Expired |
| US6685853B1 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Electricity | 62 | Expired |
| US6210856A | Resist composition and process of forming a patterned resist layer on a substrate | Physics | 59 | Expired |
| US5272042A | Positive photoresist system for near-UV to visible imaging | Emerging Cross-Sectional Technologies | 48 | Expired |
| US5659203A | Reworkable polymer chip encapsulant | Electricity | 48 | Expired |
| US5401614A | Mid and deep-UV antireflection coatings and methods for use thereof | Emerging Cross-Sectional Technologies | 46 | Expired |
| US6503692B2 | Antireflective silicon-containing compositions as hardmask layer | Emerging Cross-Sectional Technologies | 44 | Expired |
| US5554485A | Mid and deep-UV antireflection coatings and methods for use thereof | Emerging Cross-Sectional Technologies | 43 | Expired |
| US5744537A | Antireflective coating films | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6057080A | Top antireflective coating film | Emerging Cross-Sectional Technologies | 41 | Expired |
| US6207787A | Antireflective coating for microlithography | Chemistry; Metallurgy | 41 | Expired |
| US6346484B1 | Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures | Electricity | 38 | Expired |
| US6420084B1 | Mask-making using resist having SIO bond-containing polymer | Physics | 38 | Expired |
| US6561220B2 | Apparatus and method for increasing throughput in fluid processing | Emerging Cross-Sectional Technologies | 37 | Expired |
| US5607824A | Antireflective coating for microlithography | Chemistry; Metallurgy | 36 | Expired |
| US6451510B1 | Developer/rinse formulation to prevent image collapse in resist | Physics | 33 | Expired |
| US6686124B1 | Multifunctional polymeric materials and use thereof | Physics | 32 | Expired |
| US3934057A | High sensitivity positive resist layers and mask formation process | Emerging Cross-Sectional Technologies | 31 | Expired |
| US5955222A | Method of making a rim-type phase-shift mask and mask manufactured thereby | Physics | 29 | Expired |
| US6221568A | Developers for polychloroacrylate and polychloromethacrylate based resists | Physics | 28 | Expired |
| US6037097A | E-beam application to mask making using new improved KRS resist system | Emerging Cross-Sectional Technologies | 27 | Expired |
| US5164278A | Speed enhancers for acid sensitized resists | Emerging Cross-Sectional Technologies | 27 | Expired |
| US6107177A | Silylation method for reducing critical dimension loss and resist loss | Electricity | 26 | Expired |
| US5930597A | Reworkable polymer chip encapsulant | Electricity | 26 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.